Výstupy výzkumu a vývoje

Název:New Risks in OHS with Focus on Selected Nanotechnological Workplaces
Druh:D - Stať ve sborníku
Tvůrci:BÁRTLOVÁ, Kateřina; KLOUDA, Karel; NECHVÁTAL, Marek; ROUPCOVÁ, Petra; BERNATÍKOVÁ, Šárka
Dodavatel:Ministerstvo práce a sociálních věcí
Odkaz:
Aktivita:Institucionální podpora
RIV VaVaI:https://www.isvavai.cz/riv?s=rozsirene-vyhledavani&ss=detail&n=0&h=RIV%2F00025950%3A_____%2F19%3AN0000022%21RIV20-MPS-00025950
Rok:2019
Popis:Nanotechnology is part of a group of “new risks” that have not been addressed at all from the point of view of the occupation health and safety (OHS). The basic precondition for risk management is based on sufficient information about nanomaterials used i.e. their behavior and properties, exposure to toxic effects etc. Because of the many uncertainties that nanomaterials possess, the application of the standard risk management approach is ineffective. For this reason, Control Branding (C) methods are gradually introduced and are used to assess exposure when exposure limit values are not set. Selected workplaces (engineering, agricultural production, human activities and food production) were selected as part of the article and measurements (Testo DiSCmini device) confirming the main sources of nanomaterial production in anthropogenic industrial production or in operations of human activity. Subsequently, they identified the way they were distributed in the technological space and found the factors in this space that played a role in changing the concentration or properties of the nanoparticles and their distribution. In the group of tested workplaces, the highest risk was found in the smelting and casting of aluminum, and copper soldering in the engineering production. Elimination of the risk of nanoparticle scarring is generally not possible in practice, and it is therefore necessary to define and implement such preventive measures that will provide the required protection for employees.

Sborník: Proceedings of the 29th European Safety and Reliability Conference (ESREL)